The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2024

Filed:

Dec. 16, 2020
Applicant:

Disco Corporation, Tokyo, JP;

Inventors:

Satoshi Kobayashi, Tokyo, JP;

Youngsuk Kim, Tokyo, JP;

Nobuyuki Kimura, Tokyo, JP;

Yuki Ikku, Tokyo, JP;

Zhiwen Chen, Tokyo, JP;

Assignee:

DISCO CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); B23K 1/00 (2006.01); B23K 1/005 (2006.01); B23K 3/08 (2006.01); B23K 26/03 (2006.01); B23K 26/06 (2014.01); B23K 101/40 (2006.01); G02B 19/00 (2006.01); G02B 27/30 (2006.01);
U.S. Cl.
CPC ...
H01L 24/75 (2013.01); B23K 1/0016 (2013.01); B23K 1/0056 (2013.01); B23K 3/08 (2013.01); B23K 26/034 (2013.01); B23K 26/0608 (2013.01); B23K 26/0648 (2013.01); B23K 26/0665 (2013.01); G02B 19/0009 (2013.01); G02B 19/0047 (2013.01); H01L 24/81 (2013.01); B23K 2101/40 (2018.08); G02B 27/30 (2013.01); H01L 2224/75253 (2013.01); H01L 2224/75263 (2013.01); H01L 2224/7555 (2013.01); H01L 2224/81224 (2013.01); H01L 2224/81815 (2013.01); H01L 2924/3511 (2013.01);
Abstract

A laser reflow apparatus reflows solder bumps disposed on a side of a semiconductor chip in a workpiece and included in an irradiation range on the workpiece by applying a laser beam to an opposite side of the semiconductor chip. The laser reflow apparatus includes a spatial beam modulation unit including a laser power density setting function to locally set the laser power density in the irradiation range of a laser beam emitted from a laser beam source, and an image focusing unit including an image focusing function to focus the laser beam emitted from the laser beam source and apply the focused laser beam to the irradiation range on the workpiece.


Find Patent Forward Citations

Loading…