The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2024
Filed:
Aug. 11, 2020
Tokyo Electron Limited, Tokyo, JP;
Jun Yamawaku, Nirasaki, JP;
Chishio Koshimizu, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
There is provided a focus ring that is capable of preventing deposits from adhering to a member having a lower temperature in a gap between two members having different temperatures. A focus ringis disposed to surround a peripheral portion of a wafer W in a chamberof a substrate processing apparatus. The focus ringincludes an inner focus ringand an outer focus ring. Here, the inner focus ringis placed adjacent to the wafer W and configured to be cooled; and the outer focus ringis placed so as to surround the inner focus ringand configured not to be cooled. Further, a block memberis provided in a gap between the inner focus ringand the outer focus ring