The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2024
Filed:
Sep. 22, 2021
Shanghaitech University, Shanghai, CN;
Guangyao Yan, Shanghai, CN;
Xinzhe Liu, Shanghai, CN;
Yajun Ha, Shanghai, CN;
Hui Wang, Shanghai, CN;
SHANGHAITECH UNIVERSITY, Shanghai, CN;
Abstract
A ripple push method for a graph cut includes: obtaining an excess flow ef(v) of a current node v; traversing four edges connecting the current node v in top, bottom, left and right directions, and determining whether each of the four edges is a pushable edge; calculating, according to different weight functions, a maximum push value of each of the four edges by ef=ef(v)*W, where W denotes a weight function; and traversing the four edges, recording a pushable flow of each of the four edges, and pushing out a calculated flow. The ripple push method explores different push weight functions, and significantly improves the actual parallelism of the push-relabel algorithm.