The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2024

Filed:

Aug. 18, 2021
Applicant:

Bystronic Laser Ag, Niederönz, CH;

Inventors:

Michael Held, Heimiswil, CH;

Dario Piga, Lugano, CH;

Loris Roveda, Lugano, CH;

Alessio Benavoli, Naas, IE;

Luca Maria Gambardella, Massagno, CH;

Assignee:

BYSTRONIC LASER AG, Niederönz, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 13/04 (2006.01); B23K 26/38 (2014.01); G06N 7/01 (2023.01);
U.S. Cl.
CPC ...
G05B 13/042 (2013.01); B23K 26/38 (2013.01); G06N 7/01 (2023.01);
Abstract

The present disclosure relates to a method of calculating process parameters. which are optimized for processing a workpiece with specific material properties by means of a laser machine, comprising the method steps of: determining material properties for which the process parameters should be optimized; determining preconfigured initial process parameters; executing a re-optimization algorithm until a target objective function is minimized or maximized for calculating optimized material-specific process parameters by accessing a storage with a statistical model, wherein the statistical model is based on Bayesian optimization using Gaussian Processes as priors.


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