logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11923196 B1

PDFFull Text
Date of Patent:
Mar. 05, 2024

Filed:

Jun. 17, 2021

Photomask pellicle and method of forming the same

Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Yun-Yue Lin, Hsinchu, TW;

Chen-Chieh Yu, Hsinchu, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;

Attorneys:

WPAT LAW

Anthony King

Primary Examiner:

Cheung Lee

Int. Cl.
CPC ...
H01L 21/02 (2006.01); G03F 1/64 (2012.01); H01L 21/033 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02603 (2013.01); G03F 1/64 (2013.01); H01L 21/02444 (2013.01); H01L 21/0332 (2013.01); H01L 21/0337 (2013.01); H01L 29/0669 (2013.01);
Abstract

A first capping layer is deposited over a substrate. A network of nanowires is grown over the first capping layer. A second capping layer is deposited over the network of nanowires. The substrate is etched to form a frame of a pellicle. The first capping layer and the second capping layer are patterned to form a membrane of the pellicle, wherein the patterning reduces a material of the first capping layer and the second capping layer to form a coating on the nanowires.

Find Patent Forward Citations

Lin, Yun-Yue. (2024). Photomask pellicle and method of forming the same (U.S. Patent No. 11923196). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11923196

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…