The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2024

Filed:

May. 25, 2021
Applicant:

National Cheng Kung University, Tainan, TW;

Inventors:

Fan-Tien Cheng, Tainan, TW;

Yu-Ming Hsieh, Kaohsiung, TW;

Tan-Ju Wang, Tainan, TW;

Li-Hsuan Peng, Tainan, TW;

Chin-Yi Lin, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 13/02 (2006.01); G06N 3/08 (2023.01);
U.S. Cl.
CPC ...
G05B 13/027 (2013.01); G06N 3/08 (2013.01);
Abstract

A virtual metrology method using a convolutional neural network (CNN) is provided. In this method, a dynamic time warping (DTW) algorithm is used to delete unsimilar sets of process data, and adjust the sets of process data to be of the same length, thereby enabling the CNN to be used for virtual metrology. A virtual metrology model of the embodiments of the present invention includes several CNN models and a conjecture model, in which plural inputs of the CNN model are sets of time sequence data of respective parameters, and plural outputs of the CNN models are inputs to the conjecture model.


Find Patent Forward Citations

Cheng, Fan-Tien. (2024). Virtual metrology method using convolutional neural network and computer program product thereof (U.S. Patent No. 11921474). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11921474

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…