The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Feb. 27, 2023
Applicant:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;
Inventors:
Junichi Tsuchiya, Kawasaki, JP;
Keiichi Ibata, Kawasaki, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); C08F 12/24 (2006.01); C08G 8/24 (2006.01); C08G 61/12 (2006.01); C09D 125/08 (2006.01); C09D 125/14 (2006.01); C09D 161/06 (2006.01); C09D 165/00 (2006.01); G03F 7/16 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
G03F 7/094 (2013.01); C08F 12/24 (2013.01); C08G 8/24 (2013.01); C08G 61/124 (2013.01); C09D 125/08 (2013.01); C09D 125/14 (2013.01); C09D 161/06 (2013.01); C09D 165/00 (2013.01); H01L 21/0337 (2013.01); H01L 21/31144 (2013.01); C08G 2261/124 (2013.01); C08G 2261/1422 (2013.01); C08G 2261/148 (2013.01); C08G 2261/18 (2013.01); C08G 2261/228 (2013.01); C08G 2261/314 (2013.01); C08G 2261/3241 (2013.01); C08G 2261/3326 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01);
Abstract
A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.