The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Nov. 02, 2021
Hamamatsu Photonics K.k., Hamamatsu, JP;
Kiyotada Hosokawa, Hamamatsu, JP;
Shigeru Eura, Hamamatsu, JP;
HAMAMATSU PHOTONICS K.K., Hamamatsu, JP;
Abstract
An orientation characteristic measurement system () includes an irradiation optical system (), a detection optical system (), a light detector (), a rotation mechanism () changing an angle (ϕ) between a surface of the sample and an optical axis (L) of the detection optical system (), and a computer (), and the computer () includes a rotation mechanism control unit () controlling the rotation mechanism (), a distribution acquisition unit () normalizing an angle-dependent distribution of light intensity to acquire an angle-dependent distribution of light intensity, an area specifying unit () specifying light intensity in a maximum area on the basis of the angle-dependent distribution of the light intensity, and a parameter calculation unit () calculating the orientation parameter (S) on the basis of a linear relationship determined using the film thickness and refractive index of the sample and the light intensity in the maximum area.