The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2024

Filed:

Jul. 18, 2022
Applicants:

Flosfia Inc., Kyoto, JP;

Kyoto University, Kyoto, JP;

Inventors:

Shizuo Fujita, Kyoto, JP;

Kentaro Kaneko, Kyoto, JP;

Toshimi Hitora, Kyoto, JP;

Tomochika Tanikawa, Kyoto, JP;

Assignees:

FLOSFIA INC., Kyoto, JP;

KYOTO UNIVERSITY, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 29/06 (2006.01); H01L 29/47 (2006.01); H01L 29/778 (2006.01); H01L 29/78 (2006.01); H01L 29/808 (2006.01); H01L 29/812 (2006.01); H01L 29/872 (2006.01); H01L 33/02 (2010.01); H01L 29/24 (2006.01); H01L 29/739 (2006.01); H01L 29/12 (2006.01); H02M 3/28 (2006.01); H01L 33/26 (2010.01);
U.S. Cl.
CPC ...
H01L 29/06 (2013.01); H01L 29/12 (2013.01); H01L 29/24 (2013.01); H01L 29/47 (2013.01); H01L 29/739 (2013.01); H01L 29/7391 (2013.01); H01L 29/778 (2013.01); H01L 29/78 (2013.01); H01L 29/808 (2013.01); H01L 29/812 (2013.01); H01L 29/872 (2013.01); H01L 33/02 (2013.01); H01L 33/26 (2013.01); H02M 3/28 (2013.01);
Abstract

A new and useful p-type oxide semiconductor with a wide band gap and an enhanced electrical conductivity and the method of manufacturing the p-type oxide semiconductor are provided. A method of manufacturing a p-type oxide semiconductor including: generating atomized droplets by atomizing a raw material solution containing at least a d-block metal in the periodic table and a metal of Group 13 of the periodic table; carrying the atomized droplets onto a surface of a base by using a carrier gas; causing a thermal reaction of the atomized droplets adjacent to the surface of the base under an atmosphere of oxygen to form the p-type oxide semiconductor on the base.


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