The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2024
Filed:
Nov. 25, 2020
Tokyo Electron Limited, Tokyo, JP;
Suguen Lee, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing apparatus includes a holder configured to hold a substrate horizontally; a substrate rotating unit configured to rotate the holder; a nozzle configured to supply a fluid onto a top surface of the substrate; a supply unit configured to supply the fluid to the nozzle; and a moving unit configured to move the nozzle in a diametrical direction of the substrate. The nozzle includes a first nozzle member configured to discharge the fluid and a second nozzle member configured to discharge the fluid in a direction different from a direction in which the first nozzle member discharges the fluid. Discharge lines of the first and the second nozzle members intersect with each other at an intersection point. The supply unit includes a first and a second flow rate controllers configured to respectively control discharge amounts of the first and the second nozzle members independently.