The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2024
Filed:
Oct. 02, 2019
Applicant:
Osram Opto Semiconductors Gmbh, Regensburg, DE;
Inventors:
Andreas Biebersdorf, Regensburg, DE;
Stefan Illek, Donaustauf, DE;
Christoph Klemp, Regensburg, DE;
Ines Pietzonka, Donaustauf, DE;
Petrus Sundgren, Lappersdorf, DE;
Assignee:
OSRAM OPTO SEMICONDUCTORS GMBH, Regensburg, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/223 (2006.01); H01L 21/225 (2006.01); H01L 31/18 (2006.01); H01L 33/00 (2010.01); H01L 33/02 (2010.01); H01L 33/06 (2010.01); H01L 33/20 (2010.01); H01L 33/30 (2010.01);
U.S. Cl.
CPC ...
H01L 21/2233 (2013.01); H01L 21/2258 (2013.01); H01L 31/184 (2013.01); H01L 33/0095 (2013.01); H01L 33/025 (2013.01); H01L 33/06 (2013.01); H01L 33/20 (2013.01); H01L 33/30 (2013.01);
Abstract
The invention relates to a method for producing a semiconductor component comprising performing a plasma treatment of an exposed surface of a semiconductor material with halogens, and carrying out a diffusion method with dopants on the exposed surface.