The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2024
Filed:
Feb. 21, 2022
Hitachi High-tech Corporation, Tokyo, JP;
Momoyo Enyama, Tokyo, JP;
Akira Ikegami, Tokyo, JP;
Takeshi Morimoto, Tokyo, JP;
Yasuhiro Shirasaki, Tokyo, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
Provided is a projection electron beam application apparatus suitable for use in semiconductor manufacturing lines. An electron optical system of the electron beam application apparatus includes a mirror aberration correctordisposed perpendicular to an optical axis, a plurality of magnetic field sectorsby which an orbit of electrons is deviated from the optical axis to make the electrons incident on the mirror aberration corrector, and the orbit of the electrons emitted from the mirror aberration correctoris returned to the optical axis, and a doublet lensdisposed between adjacent magnetic field sectors along the orbit of the electrons. The plurality of magnetic field sectors have the same deflection angle for deflecting the orbit of the electrons, and the doublet lens is disposed such that an object plane and an image plane thereof are respectively central planes of the adjacent magnetic field sectors along the orbit of the electrons.