The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2024
Filed:
Jun. 05, 2023
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Chrysostomos Batistakis, Eindhoven, NL;
Roger Josef Maria Jeurissen, Heel, NL;
Koen Gerhardus Winkels, Schijndel, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/30 (2020.01); G06F 30/28 (2020.01); G03F 7/00 (2006.01); G06F 30/398 (2020.01); G06F 30/3308 (2020.01); G06F 119/18 (2020.01); G06F 111/10 (2020.01);
U.S. Cl.
CPC ...
G06F 30/398 (2020.01); G03F 7/705 (2013.01); G06F 30/28 (2020.01); G06F 30/3308 (2020.01); G03F 7/70608 (2013.01); G03F 7/70625 (2013.01); G06F 2111/10 (2020.01); G06F 2119/18 (2020.01);
Abstract
A method for determining a deformation of a resist in a patterning process. The method involves obtaining a resist deformation model of a resist having a pattern, the resist deformation model configured to simulate a fluid flow of the resist due to capillary forces acting on a contour of at least one feature of the pattern; and determining, via the resist deformation model, a deformation of a resist pattern to be developed based on an input pattern to the resist deformation model.