The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2024

Filed:

Jul. 15, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Xin Miao, San Jose, CA (US);

Kangguo Cheng, Schenectady, NY (US);

Chen Zhang, Guilderland, NY (US);

Wenyu Xu, Albany, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/66 (2006.01); H10B 10/00 (2023.01);
U.S. Cl.
CPC ...
H01L 29/7846 (2013.01); H01L 29/66553 (2013.01); H01L 29/785 (2013.01); H01L 2029/7858 (2013.01); H10B 10/12 (2023.02);
Abstract

Vertical transport field-effect transistors are formed on active regions wherein the active regions each include a wrap-around metal silicide contact on vertically extending side walls of the active region. Such wrap-around contacts form self-aligned and reliable strapping for SRAM bottom nFET and pFET source/drain regions. Buried contacts of SRAM cells may be used to strap the wrap-around metal silicide contacts with the gates of inverters thereof. Wrap-around metal silicide contacts provide additional contacts for logic FETs and reduce parasitic bottom source/drain resistance.


Find Patent Forward Citations

Loading…