The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2024

Filed:

Aug. 30, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chih-Yu Tseng, Hsinchu County, TW;

Wei-Lun Hu, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/528 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 23/528 (2013.01); H01L 21/7684 (2013.01); H01L 21/76819 (2013.01); H01L 21/76837 (2013.01); H01L 21/76885 (2013.01);
Abstract

A semiconductor device includes a substrate, a first metal layer, a dielectric layer, and a second metal layer. The substrate includes a dense region and an isolation region. The first metal layer is disposed over the substrate and includes a first metal pattern and a second metal pattern. The first metal pattern is located in the dense region. There is at least one slot in the first metal pattern. The second metal pattern is located in the isolation region. The dielectric layer is disposed on the first metal layer. The second metal layer is disposed on the dielectric layer.


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