The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2024

Filed:

Sep. 25, 2019
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Hideji Naohara, Kyoto, JP;

Yuji Okita, Kyoto, JP;

Hiroaki Kakuma, Kyoto, JP;

Tatsuya Masui, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/306 (2006.01); H01L 21/687 (2006.01); G06T 7/00 (2017.01); G06T 7/11 (2017.01); G06T 7/73 (2017.01); H04N 23/58 (2023.01); H04N 23/695 (2023.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 22/12 (2013.01); G06T 7/0004 (2013.01); G06T 7/11 (2017.01); G06T 7/73 (2017.01); H01L 21/30604 (2013.01); H01L 21/6708 (2013.01); H04N 23/58 (2023.01); H04N 23/695 (2023.01); G06T 2207/20216 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A substrate processing apparatus that includes a substrate holder, a cup member, an elevating mechanism, a first nozzle, and a camera. The substrate holder holds a substrate and rotates the substrate. The cup member surrounds the outer circumference of the substrate holder. The elevating mechanism moves up the cup member so that the upper end portion of the cup member is located at the upper end position higher than the substrate held by the substrate holder. The first nozzle has a discharge port at a position lower than the upper end position, and discharges first processing liquid from the discharge port to an end portion of the substrate. The camera images an imaging region that includes the first processing liquid discharged from the discharge port of the first nozzle and is viewed from an imaging position above the substrate.


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