The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
Oct. 01, 2021
Applicant:
Entegris, Inc., Billerica, MA (US);
Inventors:
Daniela White, Ridgefield, CT (US);
YoungMin Kim, Suwon-si, KR;
Michael L. White, Ridgefield, CT (US);
Assignee:
ENTEGRIS, INC., Billerica, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/30 (2006.01); C11D 11/00 (2006.01); C11D 7/32 (2006.01); C11D 7/26 (2006.01); H01L 21/02 (2006.01); C11D 7/34 (2006.01); C11D 7/50 (2006.01);
U.S. Cl.
CPC ...
C11D 11/0047 (2013.01); C11D 7/263 (2013.01); C11D 7/265 (2013.01); C11D 7/267 (2013.01); C11D 7/3218 (2013.01); C11D 7/3281 (2013.01); C11D 7/34 (2013.01); C11D 7/5022 (2013.01); H01L 21/02065 (2013.01);
Abstract
In general, the invention provides high pH cleaning compositions for dielectric surfaces such as PETEOS, SiO, thermal oxide, silicon nitride, silicon, etc. The compositions of the invention afford superior surface wetting, dispersion of particles and organic residues, and prevents redeposition and re-agglomeration of the dispersed residue during cleaning to afford superior cleaning and low defectivity.