The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2024

Filed:

Mar. 29, 2021
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Andrea Illiberi, Leuven, BE;

Giuseppe Alessio Verni, Antwerp, BE;

Shaoren Deng, Ghent, BE;

Daniele Chiappe, Espoo, FI;

Eva Tois, Helsinki, FI;

Marko Tuominen, Helsinki, FI;

Michael Givens, Oud-Heverlee, BE;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); B01J 21/02 (2006.01); C23C 22/82 (2006.01); C23C 22/77 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
C23C 16/04 (2013.01); B01J 21/02 (2013.01); C23C 16/402 (2013.01); C23C 22/77 (2013.01); C23C 22/82 (2013.01);
Abstract

Methods for selective deposition of silicon oxide films on dielectric surfaces relative to metal surfaces are provided. A metal surface of a substrate may be selectively passivated relative to the dielectric surface, such as with a polyimide layer or thiol SAM. Silicon oxide is selectively deposited on the dielectric surface relative to the passivated metal surface by contacting the dielectric surface with a metal catalyst and a silicon precursor comprising a silanol.


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