The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2024

Filed:

Jun. 22, 2021
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Atsushi Takeuchi, Yamanashi, JP;

Toru Kitada, Yamanashi, JP;

Kanto Nakamura, Yamanashi, JP;

Atsushi Gomi, Yamanashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/52 (2006.01); C23C 14/35 (2006.01); H10N 50/01 (2023.01); H10N 50/85 (2023.01);
U.S. Cl.
CPC ...
H01J 37/3461 (2013.01); C23C 14/35 (2013.01); C23C 14/52 (2013.01); H01J 37/3405 (2013.01); H01J 37/3426 (2013.01); H01J 37/3479 (2013.01); H10N 50/01 (2023.02); H10N 50/85 (2023.02); H01J 2237/24564 (2013.01); H01J 2237/332 (2013.01);
Abstract

A film forming apparatus for forming a film on a substrate by using a magnetron sputtering method. The film forming apparatus includes: a substrate holder configured to hold a substrate; a target holder configured to hold a target made of a ferromagnetic material to face the substrate holder; a magnet provided on a surface of the target holder opposite to the substrate holder, and configured to leak a magnetic field to a front surface of the target held by the target holder that is a surface close to the substrate holder; and a magnetic field strength measurement device configured to measure a strength of the magnetic field.


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