The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2024

Filed:

Jun. 11, 2021
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventor:

Takehiro Ueda, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/544 (2006.01); H01L 21/304 (2006.01); H01L 21/66 (2006.01); H01L 23/31 (2006.01); H01L 23/482 (2006.01); H01L 29/40 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 23/544 (2013.01); H01L 21/304 (2013.01); H01L 22/12 (2013.01); H01L 22/32 (2013.01); H01L 23/3171 (2013.01); H01L 23/4824 (2013.01); H01L 29/402 (2013.01); H01L 29/7813 (2013.01); H01L 22/00 (2013.01); H01L 2223/5444 (2013.01); H01L 2223/5448 (2013.01); H01L 2223/54433 (2013.01); H01L 2223/54453 (2013.01);
Abstract

A method for manufacturing a semiconductor device includes forming semiconductor devices from a semiconductor wafer and identifying a position of the semiconductor device in the semiconductor wafer, wherein the forming the semiconductor devices includes forming a first repeating pattern including i semiconductor devices each having a unique pattern, forming a second repeating pattern including j semiconductor devices each having a unique pattern, defining semiconductor devices on the semiconductor wafer such that each of the k semiconductor devices has a unique pattern based on the first and second repeating patterns, and grinding a backside of the semiconductor wafer, wherein each unique pattern of the k semiconductor devices is composed of a combination of the unique patterns of the first and second repeating patterns, wherein the position of the semiconductor device is identified based on the unique patterns of the first and second repeating patterns and an angle of a grinding mark.


Find Patent Forward Citations

Ueda, Takehiro. (2024). Semiconductor device and manufacturing method thereof (U.S. Patent No. 11887935). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11887935

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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