The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2024

Filed:

Sep. 04, 2020
Applicants:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Research & Business Foundation Sungkyunkwan University, Gyeonggi-do, KR;

Inventors:

Changhyun Kim, Seoul, KR;

Sangwoo Kim, Yongin-si, KR;

Kyung-Eun Byun, Seongnam-si, KR;

Hyeonjin Shin, Suwon-si, KR;

Ahrum Sohn, Pyeongtaek-si, KR;

Jaehwan Jung, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 14/34 (2006.01); C23C 14/58 (2006.01); C23C 14/06 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02631 (2013.01); C23C 14/06 (2013.01); C23C 14/34 (2013.01); C23C 14/5806 (2013.01); H01L 21/02667 (2013.01); H01L 29/66969 (2013.01); H01L 21/02568 (2013.01); H01L 21/02592 (2013.01); H01L 21/02595 (2013.01);
Abstract

Disclosed herein are a method of forming a transition metal dichalcogenide thin film and a method of manufacturing a device including the same. The method of forming a transition metal dichalcogenide thin film includes: depositing a transition metal dichalcogenide thin film on a substrate; and heat-treating the deposited transition metal dichalcogenide thin film.


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