The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2024
Filed:
Aug. 18, 2021
Hong Kong Applied Science and Technology Research Institute Company Limited, Hong Kong, CN;
Xueyan Tang, Hong Kong, CN;
Suk Ling Li, Hong Kong, CN;
Abstract
Computer implemented methods and computerized apparatus are provided for global registration between a first point cloud and a second point cloud obtained by a scanning device on an identical spatial scene at two separate instances. The method comprises extracting a first set of discriminative line-pairs from the first point cloud and a second set of discriminative line-pairs from the second point cloud, wherein a discriminative line-pair is a line-pair having high discriminative power compared to a randomly selected line-pair. In some embodiments, then a plurality of matching line-pair groups between the two sets of discriminative line-pairs are identified in accordance with one thresholding criterion related to between-line relationship, line geometry and line location; and a compass angle criterion related to compass errors of the scanning device. The method further comprises finding most reliable correspondence between the two point clouds by voting and then computing a global transformation matrix. Finally, the global transformation matrix is used to align the two point clouds. Embodiments of the present invention provide an accurate and efficient registration especially for building construction applications.