The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2024

Filed:

Feb. 04, 2020
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Shakeeb Bin Hasan, Eindhoven, NL;

Yan Ren, Eindhoven, NL;

Maikel Robert Goosen, Eindhoven, NL;

Albertus Victor Gerardus Mangnus, Eindhoven, NL;

Erwin Paul Smakman, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/04 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/04 (2013.01); H01J 37/28 (2013.01); H01J 2237/028 (2013.01);
Abstract

Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer and a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate.


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