The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2024
Filed:
Feb. 01, 2021
Jsr Corporation, Tokyo, JP;
Shin-ya Nakafuji, Tokyo, JP;
Hiroki Nakatsu, Tokyo, JP;
Tomoaki Taniguchi, Tokyo, JP;
Tomohiro Oda, Tokyo, JP;
JSR CORPORATION, Tokyo, JP;
Abstract
A composition that enables a resist underlayer film to be formed, contains: a compound having at least one partial structure represented by formula (1); and a solvent. In the formula (1), for example, Arrepresents a group obtained by removing (p+1) hydrogen atoms on an aromatic carbon ring from a substituted or unsubstituted arene having 6 to 30 ring atoms, or a group obtained by removing (p+1) hydrogen atoms on an aromatic heteroring from a substituted or unsubstituted heteroarene having 5 to 30 ring atoms; Arrepresents a substituted or unsubstituted aryl group having 6 to 30 ring atoms, or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms, and Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and Rrepresents an ethynediyl group or a substituted or unsubstituted ethenediyl group.