The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2024
Filed:
Mar. 22, 2022
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Alexander Wolf, Essingen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
A measurement method for interferometrically measuring the shape of a surface () of a test object (). A test wave (--) directed at the test object has a wavefront that is at least partially adapted to the desired shape of the surface, and a reference wave (--) directed at a reflective optical element (-) has a propagation direction that deviates from the propagation direction of the test wave (--) for each of two input waves by diffraction at a diffractive element (). For each wavelength, the test wave is superimposed after interaction with the test object with the associated reference wave after the back-reflection at the first reflective optical element. The test and reference waves are diffracted again at the diffractive element for superposition. An interferogram produced by the superposition is captured in a capture plane (--). The interferograms are jointly evaluated.