The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2024
Filed:
May. 11, 2021
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventor:
Xinrong Jiang, Palo Alto, CA (US);
Assignee:
KLA CORPORATION, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/09 (2006.01); H01J 37/12 (2006.01); H01J 37/073 (2006.01); H01J 37/14 (2006.01);
U.S. Cl.
CPC ...
H01J 37/09 (2013.01); H01J 37/073 (2013.01); H01J 37/12 (2013.01); H01J 37/14 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/0473 (2013.01);
Abstract
Multiple electron beamlets are split from a single electron beam. The electron beam passes through an acceleration tube, a beam-limiting aperture, an anode disposed between an electron beam source and the acceleration tube, a focusing lens downstream from the beam-limiting aperture, and a micro aperture array downstream from the acceleration tube. The micro aperture array generates beamlets from the electron beam. The electron beam can be focused from a divergent illumination beam into a telecentric illumination beam.