The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2024
Filed:
Apr. 12, 2021
The Regents of the University of Colorado, Denver, CO (US);
Christina Porter, Superior, CO (US);
Daniel E. Adams, Thornton, CO (US);
Michael Tanksalvala, Longmont, CO (US);
Elisabeth Shanblatt, Boulder, CO (US);
Margaret M. Murnane, Boulder, CO (US);
Henry C. Kapteyn, Boulder, CO (US);
Regents of the Univ of Colorado, a body corporate, Denver, CO (US);
Abstract
Apparatus and methods for complex imaging reflectometry and refractometry using at least partially coherent light. Quantitative images yield spatially-dependent, local material information about a sample of interest. These images may provide material properties such as chemical composition, the thickness of chemical layers, dopant concentrations, mixing between layers of a sample, reactions at interfaces, etc. An incident beam of VUV wavelength or shorter is scattered off of a sample and imaged at various angles, wavelengths, and/or polarizations. The power of beam is also measured. This data is used to obtain images of a sample's absolute, spatially varying, complex reflectance or transmittance, which is then used to determine spatially-resolved, depth-dependent sample material properties.