The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2024

Filed:

Dec. 06, 2021
Applicant:

Io Tech Group Ltd., London, GB;

Inventors:

Ziv Gilan, Kfar-harif, IL;

Daniel Liptz, Jerusalem, IL;

Assignee:

IO Tech Group Ltd., Hamaayan, IL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 64/209 (2017.01); B33Y 30/00 (2015.01); B29C 64/227 (2017.01); B33Y 10/00 (2015.01);
U.S. Cl.
CPC ...
B29C 64/209 (2017.08); B29C 64/227 (2017.08); B33Y 30/00 (2014.12); B33Y 10/00 (2014.12);
Abstract

Systems for material deposition. One such system includes a number of containers arranged relative to one another in a conical or other shape, pointing toward a common deposition point. When not actively depositing material, the containers are held at a distance from the deposition point. Another system has a rod disposed within a container and a flexible tip on the rod seals a material exit of the container when biased closed. Pressurized gas introduced into the container forces the rod away from the material exit and material from the container. In yet another system, a container includes a barrel adapter having a one-way air valve that seals the container and creates a vacuum, preventing material from leaking from the container. Upon application of a pressurized gas, the one-way valve is forced open and material is deposited from the container. The valve closes automatically in the absence of the gas.


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