The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2023
Filed:
Feb. 25, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Wendell Glenn Boyd, Jr., Morgan Hill, CA (US);
Matthew Boyd, Morgan Hill, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods, systems, and apparatus for conducting chucking operations are disclosed that use an adjusted chucking voltage if a process shift occurs. In one implementation, a method includes conducting a first processing operation on a substrate in a processing chamber. The first processing operation includes applying a chucking voltage to an electrostatic chuck (ESC) in the processing chamber while the substrate is supported on the ESC. The method includes determining that a process shift has occurred. The determining that the process shift has occurred includes one or more of: determining that a center of the substrate has moved by a post-processing shift relative to a pre-processing location of the center prior to the first processing operation, or determining that a defect count of a backside surface of the substrate exceeds a defect threshold. The method includes determining an adjusted chucking voltage based on the occurrence of the process shift.