The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2023

Filed:

Aug. 26, 2022
Applicant:

Shanghai Huali Microelectronics Corporation, Shanghai, CN;

Inventors:

Cheng Wu, Shanghai, CN;

Shuqing Duan, Shanghai, CN;

Jinde Gao, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 31/28 (2006.01); H05K 1/02 (2006.01); H05K 3/00 (2006.01);
U.S. Cl.
CPC ...
G01R 31/2836 (2013.01); H05K 1/0268 (2013.01); H05K 3/00 (2013.01);
Abstract

The present application discloses a method for locating an open circuit failure point of a test structure, which includes the following steps: step: providing a sample formed with a test structure, a first metal layer pattern and a second metal layer pattern of the test structure forming a series resistor structure through each via; step: performing a first active voltage contrast test to the sample to show an open circuit point and making a first scratch mark at an adjacent position of the open circuit point; step: forming a coating mark at the first scratch mark on the sample; step: performing a second active voltage contrast test to the sample to show the open circuit point and locating a relative position of the open circuit point by using a position of the coating mark as a reference position.


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