The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 2023

Filed:

Nov. 30, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Zhepeng Cong, San Jose, CA (US);

Mostafa Baghbanzadeh, Oakland, CA (US);

Tao Sheng, Santa Clara, CA (US);

Enle Choo, Saratoga, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/46 (2006.01); G01B 17/02 (2006.01); C23C 16/52 (2006.01); C23C 16/44 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02293 (2013.01); C23C 16/4412 (2013.01); C23C 16/455 (2013.01); C23C 16/463 (2013.01); C23C 16/52 (2013.01); G01B 17/02 (2013.01); G01B 17/025 (2013.01);
Abstract

The present disclosure generally relates to process chambers for semiconductor processing. In one embodiment, a growth monitor for substrate processing is provided. The growth monitor includes a sensor holder and a crystal disposed in the sensor holder having a front side and a back side. An opening is formed in the sensor holder exposing a front side of the crystal. A gas inlet is disposed through the sensor holder to a plenum formed by the back side of the crystal and the sensor holder. A gas outlet is fluidly coupled to the plenum.


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