The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 2023

Filed:

Jan. 28, 2022
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Akio Yamamoto, Tokyo, JP;

Wen Li, Tokyo, JP;

Hiroshi Oinuma, Tokyo, JP;

Shunsuke Mizutani, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/244 (2006.01); H01J 37/28 (2006.01); H01J 37/22 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/244 (2013.01); H01J 37/222 (2013.01); H01J 37/265 (2013.01); H01J 37/28 (2013.01); H01J 2237/2443 (2013.01); H01J 2237/2826 (2013.01);
Abstract

Provided is a charged particle beam device and a charged particle beam device calibration method capable of correcting an influence of characteristic variation and noise with high accuracy. Control units execute a first calibration of correcting a characteristic variation between a plurality of channels in detectors and signal processing circuits by using a setting value of a control parameter for each of the plurality of channels in a state in which a primary electron beam is not emitted. The control units further execute a second calibration of correcting a characteristic variation between the plurality of channels in scintillators or the like by using the setting value of the control parameter for each of the plurality of channels in a state in which the primary electron beam is emitted.


Find Patent Forward Citations

Loading…