The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 2023

Filed:

Jul. 17, 2023
Applicant:

Auros Technology, Inc., Hwaseong-si, KR;

Inventors:

Soo-Yeon Mo, Hwaseong-si, KR;

Hee-Chul Lim, Hwaseong-si, KR;

Assignee:

AUROS TECHNOLOGY, INC., Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 3/40 (2006.01); G06T 7/32 (2017.01); G06T 7/60 (2017.01); G06V 10/75 (2022.01); G06T 7/73 (2017.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 3/40 (2013.01); G06T 7/32 (2017.01); G06T 7/60 (2013.01); G06T 7/74 (2017.01); G06V 10/7515 (2022.01); G06T 2207/20016 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A method of centering a correlation-based overlay includes resizing an overlay target image to a size smaller than an entire image size, defining first and second templates that are symmetrical to each other based on a diagonal in the resized image, and calculating a rough center coordinate by calculating a first correlation value representing a similarity symmetrical with respect to the diagonal between images of the first and second templates; defining first and second templates symmetrical based on a diagonal passing through the rough center coordinates in an original image of the overlay target image, calculating a fine center coordinate of the overlay target image by calculating a second correlation value representing a similarity symmetrical with respect to the diagonal between the images of the first and second templates; and centering an overlay key by moving a stage to a target position based on the fine center coordinates.


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