The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2023
Filed:
Mar. 24, 2022
Applicant:
Adaptive Plasma Technology Corp., Icheon-si, KR;
Inventors:
Woo Hyung Choi, Seongnam-si, KR;
Sang Woo Lee, Suwon-si, KR;
Hwi Gon Jang, Yongin-si, KR;
Gyoung Ho Kwon, Daejeon, KR;
Assignee:
ADAPTIVE PLASMA TECHNOLOGY CORP., Icheon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L 19/06 (2006.01); G01L 9/00 (2006.01);
U.S. Cl.
CPC ...
G01L 19/0636 (2013.01); G01L 9/0041 (2013.01);
Abstract
Provided is a particle trapping apparatus for preventing an error of a pressure measurement. A particle trapping apparatus for preventing an error of a pressure measurement includes a pressure-measuring means; a measuring pipe for connecting the pressure-measuring means to a processing chamber; and a trapping means for capturing particles in a gas flowing through the measuring pipe, wherein the trapping means is coupled to the measuring pipe or is a portion of the measuring pipe.