The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2023
Filed:
Dec. 03, 2018
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Shin-Jae Kang, Seoul, KR;
Dong-Hoon Han, Seoul, KR;
Do-Hyung Kim, Seongnam-si, KR;
Kyung-Wook Park, Daegu, KR;
Kevin Bae, Hwaseong-si, KR;
Sun-Soo Lee, Yongin-si, KR;
In-Jae Lee, Seoul, KR;
Jeon-Il Lee, Suwon-si, KR;
Chae-Mook Lim, Yongin-si, KR;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01L 21/768 (2006.01); H01L 21/285 (2006.01); C23C 16/34 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/34 (2013.01); C23C 16/45561 (2013.01); H01L 21/28562 (2013.01); H01L 21/76843 (2013.01);
Abstract
In a layer deposition method, a substrate is loaded into a process chamber. A gas filling tank is charged with a gas to a predetermined charge pressure. The pressure of the gas is elevated to a pressure greater than the predetermined charge pressure. The gas is introduced into the process chamber.