The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2023

Filed:

Mar. 14, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventor:

Chien Hung Liu, Hsinchu County, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/423 (2006.01); H01L 27/11521 (2017.01); H01L 29/66 (2006.01); H01L 29/788 (2006.01); H01L 29/06 (2006.01); H01L 21/28 (2006.01); H01L 29/417 (2006.01); H01L 29/78 (2006.01); H10B 41/30 (2023.01);
U.S. Cl.
CPC ...
H01L 29/42324 (2013.01); H01L 29/0649 (2013.01); H01L 29/40114 (2019.08); H01L 29/41783 (2013.01); H01L 29/42328 (2013.01); H01L 29/66825 (2013.01); H01L 29/7835 (2013.01); H01L 29/7881 (2013.01); H10B 41/30 (2023.02);
Abstract

A semiconductor device includes a substrate, a gate structure disposed over the substrate, a drain structure disposed in the substrate, and a source structure disposed in the substrate on an n opposite side of the gate structure from the drain structure. The substrate includes a first semiconductor layer, a second semiconductor layer over the first semiconductor layer, and an insulating layer sandwiched between the first semiconductor layer and the second semiconductor layer. The source structure and the drain structure include a same conductivity type. The source structure includes at least an epitaxial layer. The source structure extends deeper into the substrate than the drain structure.


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