The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2023

Filed:

Nov. 15, 2021
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventors:

Wen-Tsung Huang, Changhua County, TW;

Shih-Yu Wang, Taipei, TW;

Chih-Wei Hsu, Changhua County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H01L 29/74 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0262 (2013.01); H01L 29/7436 (2013.01);
Abstract

The electrostatic discharge protection apparatus includes a substrate, a first well having a first conductivity type and disposed in the substrate, a second well having a second conductivity type and disposed in the first well, a first doping region having the first conductivity type and disposed in the second well, a second doping region having the first conductivity type and disposed in the second well, a third doping region having the second conductivity type and disposed in the second well, and a fourth doping region having the first conductivity type and disposed in the substrate. The first conductivity type is different from the second conductivity type. The second well, the first well, the substrate and the fourth doping region form a silicon controlled rectifier. Electrostatic discharge current flowing into the first doping region flows to the fourth doping region through the silicon controlled rectifier.


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