The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2023
Filed:
Aug. 29, 2017
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Arjen Klaver, Neerijse, BE;
Werner Knaepen, Leuven, BE;
Lucian Jdira, Nieuw Vennep, NL;
Gido van der Star, Leuven, BE;
Ruslan Kvetny, Portland, OR (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/52 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/34 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0228 (2013.01); C23C 16/345 (2013.01); C23C 16/4408 (2013.01); C23C 16/45527 (2013.01); C23C 16/45544 (2013.01); C23C 16/45553 (2013.01); C23C 16/52 (2013.01); H01L 21/0217 (2013.01); H01L 21/02208 (2013.01); H01L 21/02211 (2013.01);
Abstract
There is provided a method and apparatus for forming a layer, by sequentially repeating a layer deposition cycle to process a substrate disposed in a reaction chamber. The deposition cycle comprising: