The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2023

Filed:

Jul. 26, 2021
Applicant:

Industrial Technology Research Institute, Hsinchu, TW;

Inventors:

Tsung-Wen Tsai, New Taipei, TW;

Wai-Kwuen Choong, Tainan, TW;

Tzong-Ming Wu, Taipei, TW;

Ji-Bin Horng, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 10/85 (2021.01); G05B 13/04 (2006.01); B23K 26/342 (2014.01); B33Y 50/00 (2015.01);
U.S. Cl.
CPC ...
B22F 10/85 (2021.01); B23K 26/342 (2015.10); G05B 13/042 (2013.01); B33Y 50/00 (2014.12);
Abstract

A parameter analysis method and a parameter analysis system for metal additive manufacturing are provided. The parameter analysis method includes: establishing a powder bed model; simulating a multi-track melting result of the powder bed model according to a plurality of laser parameters to generate a melting model; analyzing the melting model to calculate a plurality of position divergences of a plurality of melting powders of the melting model, and defining a plurality of melting surface powders according to the position divergences; analyzing the melting surface powders to calculate a surface average curvature of the melting model; and determining a laser hatch in the laser parameters allows metal additive manufacturing to meet a quality as needed according to whether the surface average curvature is between a first curvature threshold and a second curvature threshold, the first curvature threshold being smaller than the second curvature threshold.


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