The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2023

Filed:

Feb. 11, 2022
Applicants:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

National Tsing Hua University, Hsinchu, TW;

Inventors:

Ya-Chin King, Taipei, TW;

Chrong Jung Lin, Hsinchu, TW;

Burn Jeng Lin, Hsinchu, TW;

Shi-Jiun Wang, Changhua, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/119 (2006.01); H01L 31/0224 (2006.01);
U.S. Cl.
CPC ...
H01L 31/119 (2013.01); H01L 31/022408 (2013.01);
Abstract

A device includes a semiconductor fin, an isolation structure, a gate structure, source/drain structures, a sensing contact, a sensing pad structure, and a reading contact. The semiconductor fin includes a channel region and source/drain regions on opposite sides of the channel region. The isolation structure laterally surrounds the semiconductor fin. The gate structure is over the channel region of the semiconductor fin. The source/drain structures are respectively over the source/drain regions of the semiconductor fin. The sensing contact is directly on the isolation structure and adjacent to the gate structure. The sensing pad structure is connected to the sensing contact. The reading contact is directly on the isolation structure and adjacent to the gate structure.


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