The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2023
Filed:
Apr. 13, 2021
Samsung Electronics Co., Ltd., Suwon-si, KR;
Kyunghun Han, Hwaseong-si, KR;
Ingi Kim, Seoul, KR;
Sangwoo Bae, Seoul, KR;
Jungchul Lee, Hwaseong-si, KR;
Minhwan Seo, Hwaseong-si, KR;
Myeongock Ko, Hwaseong-si, KR;
Youngjoo Lee, Hwaseong-si, KR;
Taehyun Kim, Suwon-si, KR;
Seulgi Lee, Suwon-si, KR;
Abstract
A wafer inspection apparatus includes: an objective lens on an optical path of first and second input beams; and an image sensor configured to generate an image of the wafer based on scattered light according to a nonlinear optical phenomenon based on the first and second input beams, wherein the first input beam passing through the objective lens is obliquely incident on the wafer at a first incident angle with respect to a vertical line that is normal to an upper surface of the wafer, the second input beam passing through the objective lens is incident on the wafer at a second incident angle oblique to the vertical line that is normal to the upper surface of the wafer, and the first and second incident angles are different from each other.