The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2023
Filed:
Mar. 02, 2020
Applicant:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;
Inventors:
Assignee:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2006.01); G03F 7/42 (2006.01); G03F 7/30 (2006.01); H01L 21/02 (2006.01); G03F 7/40 (2006.01); H01L 21/027 (2006.01); G03F 7/16 (2006.01); C11D 7/26 (2006.01); C11D 7/50 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G03F 7/325 (2013.01); C11D 7/267 (2013.01); C11D 7/5004 (2013.01); G03F 7/0048 (2013.01); G03F 7/16 (2013.01); G03F 7/30 (2013.01); G03F 7/3028 (2013.01); G03F 7/32 (2013.01); G03F 7/40 (2013.01); G03F 7/422 (2013.01); G03F 7/425 (2013.01); H01L 21/0206 (2013.01); H01L 21/02041 (2013.01); H01L 21/0273 (2013.01);
Abstract
A solution including an organic solvent (S), and an antioxidant (A), in which an antioxidant (A) includes a tocopherol compound (A1).
Iida, Hiroyuki. (2023). Solution, method of forming resist pattern, and semiconductor device manufacturing method (U.S. Patent No. 11822250). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11822250
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile