The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2023
Filed:
Feb. 26, 2020
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08L 25/06 (2006.01); C08L 33/08 (2006.01); C08L 33/14 (2006.01); G03F 7/039 (2006.01); C08L 41/00 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C08L 25/06 (2013.01); C08L 33/08 (2013.01); C08L 33/14 (2013.01); C08L 41/00 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01);
Abstract
A resist composition comprising a base polymer and a quencher in the form of a heterocyclic amine compound having a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
Quick Actions:
Hatakeyama, Jun. (2023). Resist composition and patterning process (U.S. Patent No. 11822239). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11822239
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile