The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2023
Filed:
Sep. 29, 2020
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Sean Morgan-Jones, Portland, OR (US);
Mark Najarian, Beaverton, OR (US);
Michael Schmidt, Gresham, OR (US);
Victoriea Bird, Beaverton, OR (US);
Assignee:
FEI Company, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/544 (2006.01); H01J 37/305 (2006.01); H01J 37/09 (2006.01); H01L 21/263 (2006.01); H01L 21/285 (2006.01); C23C 16/48 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 23/544 (2013.01); H01J 37/09 (2013.01); H01J 37/3053 (2013.01); C23C 16/486 (2013.01); H01J 2237/3174 (2013.01); H01J 2237/31732 (2013.01); H01L 21/02115 (2013.01); H01L 21/02271 (2013.01); H01L 21/2633 (2013.01); H01L 21/28568 (2013.01); H01L 2223/54426 (2013.01);
Abstract
Redeposition of substrate material on a fiducial resulting from charged particle beam (CPB) or laser beam milling of a substrate can be reduced with a shield formed on the substrate surface. The shield typically has a suitable height that can be selected based on proximity of an area to be milled to the fiducial. The shield can be formed with the milling beam using beam-assisted chemical vapor deposition (CVD). The same or different beams can be used for milling and beam-assisted CVD.