The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2023
Filed:
Oct. 28, 2020
Cathay Biotech Inc., Shanghai, CN;
Cibt America Inc., Newark, DE (US);
Min Xu, Shanghai, CN;
Yingli Hao, Shanghai, CN;
Chen Yang, Shanghai, CN;
Naiqiang Li, Shanghai, CN;
Xiucai Liu, Shanghai, CN;
Cathay Biotech Inc., Shanghai, CN;
CIBT America Inc., Newark, DE (US);
Abstract
The present invention provides a decanedioic acid produced by microbial fermentation process, in which the content of C10 aliphatic acid and C10 hydroxy aliphatic acid is maintained at a very low level. The present invention also provides a preparation method of the decanedioic acid and a polymer prepared by using the decanedioic acid as monomer. The decanedioic acid provided by the present invention is prepared by microbial fermentation process. The decanedioic acid product which is produced through the processes of microbial fermentation and separation has a higher purity, a higher thermal stability, and a lower impurity content. The decanedioic acid provided by the present invention could satisfy the requirements of high grade product of polyamide or polyester to produce polymer with excellent qualities. The preparation method of the decanedioic acid provided by the present invention which has many advantages of mild reaction conditions, environmental friendliness, high yield, and good product quality, may replace the chemical method to be used in industrial scale production of the decanedioic acid.