The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2023
Filed:
May. 15, 2019
Hitachi High-tech Corporation, Tokyo, JP;
Shunichi Motomura, Tokyo, JP;
Tsunenori Nomaguchi, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
Provided is a charged particle beam apparatus capable of stably obtaining a spherical aberration correction effect. The charged particle beam apparatus includes: a charged particle beam aperture stopand an electrodethat are arranged on an optical axis between the charged particle beam sourceand the objective lens; and a power supplythat applies a voltage between the charged particle beam aperture stopand the electrode, in which the voltage that is applied from the electrode to the charged particle beam aperture stop by the power supply is a voltage having a polarity opposite to a charge of the charged particle beam, the electrodeincludes an annular aperture, and the charged particle beam aperture stopincludes a plurality of aperturesthat are arranged at positions overlapping the annular apertureof the electrodewhen viewed in a direction Z along the optical axis.