The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2023

Filed:

Mar. 25, 2020
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Albertus Victor Gerardus Mangnus, Eindhoven, NL;

Maikel Robert Goosen, Eindhoven, NL;

Erwin Paul Smakman, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/24 (2006.01); H01J 37/244 (2006.01); H01J 37/304 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3177 (2013.01); H01J 37/243 (2013.01); H01J 37/244 (2013.01); H01J 37/3045 (2013.01); H01J 2237/0435 (2013.01);
Abstract

Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.


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