The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2023

Filed:

May. 23, 2022
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Irad Peleg, Tel Aviv, IL;

Ran Schleyen, Rehovot, IL;

Boaz Cohen, Lehavim, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 7/11 (2017.01); G06F 18/22 (2023.01); G06F 18/214 (2023.01); G06V 10/82 (2022.01); G06V 10/44 (2022.01); G06V 20/69 (2022.01); G01N 21/95 (2006.01); G06N 3/06 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G01N 21/9501 (2013.01); G06F 18/214 (2023.01); G06F 18/22 (2023.01); G06N 3/06 (2013.01); G06T 7/0008 (2013.01); G06T 7/11 (2017.01); G06V 10/454 (2022.01); G06V 10/82 (2022.01); G06V 20/69 (2022.01); G06T 2207/10061 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A system for classifying a pattern of interest (POI) on a semiconductor specimen is disclosed. The system comprises a processor and memory circuitry. The memory circuitry is configured to obtain a high-resolution image of the POI, and to generate data usable for classifying the POI in accordance with a defectiveness-related classification. To generate the data, a machine learning model is utilized that has been trained in accordance with training samples. The training samples include a high-resolution training image captured by scanning a respective training pattern on a specimen, the respective training pattern being similar to the POI. The training samples also include a label associated with the image, the label being derivative of low-resolution inspection of the respective training pattern.


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