The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2023
Filed:
Aug. 09, 2021
Gigaphoton Inc., Tochigi, JP;
Yusuke Hoshino, Oyama, JP;
Yukio Watanabe, Oyama, JP;
Toshihiro Nishisaka, Oyama, JP;
Atsushi Ueda, Oyama, JP;
Koichiro Koge, Oyama, JP;
Takayuki Osanai, Oyama, JP;
Gouta Niimi, Oyama, JP;
Gigaphoton Inc., Tochigi, JP;
Abstract
An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.