The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
Nov. 14, 2018
Applied Materials, Inc., Santa Clara, CA (US);
Lizhong Sun, San Jose, CA (US);
Xiaodong Yang, Xi'an, CN;
Yufei Zhou, Wuxi, CN;
Yi Yang, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A chamber includes a target () and a magnetron () disposed over the target (). The magnetron () includes a plurality of magnets (). The magnetron () has a longitudinal dimension and a lateral dimension. The longitudinal dimension of the magnetron () is tilted with respect to the target () so the distances between magnets () and the target () vary. As the magnetron () rotates during operation, the strength of the magnetic field produced by the magnetron () is an average of the various strengths of magnetic fields produced by the magnets (). The averaging of the strengths of the magnetic fields leads to uniform film properties and uniform target erosion.